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| CADE accepted papers | ||||||||||||
Regular papersWolfgang
Ahrendt, Chalmers U of Techn., Sweden Jean-Marc
Andreoli, Xerox Grenoble, France Gilles
Audemard, ITC-irst, Italy and Belaid Benhamou, LSIS Marseille, France Gilles
Audemard, Piergiorgio Bertoli, Alessandro Cimatti, Artur Kornilowicz, and
Roberto Sebastiani; ITC-irst, Italy Andrew
Bernard and Peter Lee, Carnegie Mellon U, USA Miquel
Bofill, U Girona, Spain and Albert Rubio, Techn. U of Catalonia, Spain Cristina
Borralleras, U Vic, Spain; Salvador Lucas, Polytechnic U of Valencia, Spain;
and Albert Rubio, Techn. U of Catalonia, Spain Chad
E. Brown, Carnegie Mellon U, USA Thierry
Boy de la Tour, IMAG Grenoble, France Leonardo
de Moura, Harald Rueß, and Maria Sorea; SRI International, USA Uwe
Egly, Vienna U of Techn., Austria Jonathan
Ford, U New England, Australia and Natarajan Shankar, SRI International,
USA Didier
Galmiche and Daniel Mery, LORIA Nancy, France Harald
Ganzinger, MPI Saarbrücken, Germany Lilia
Georgieva, U Manchester, UK; Ullrich Hustadt, U Liverpool, UK; and Renate A.
Schmidt, U Manchester, UK Eugene
Goldberg, Cadence Design Systems, USA Bernhard
Gramlich and Reinhard Pichler, Vienna U of Techn., Austria Thomas
Hillenbrand, MPI Saarbrücken, Germany and Bernd Löchner, U Kaiserslautern,
Germany Orna
Kupferman, Hebrew U of Jerusalem, Israel; Ulrike Sattler, Dresden U of Techn.,
Germany; and Moshe Y. Vardi, Rice U, USA Dominique
Larchey-Wendling, LORIA Nancy, France Christopher
Lynch and Barbara Morawska, Clarkson U, USA George
C. Necula and Robert R. Schneck, U California-Berkeley, USA Guoqiang
Pan, Rice U, USA; Ulrike Sattler, Dresden U of Techn., Germany; and Moshe Y.
Vardi, Rice U, USA Lawrence
C. Paulson, U Cambridge, UK Martin
Strecker, Techn. U of Munich, Germany Aaron
Stump and David L. Dill, Stanford U, USA Calogero
G. Zarba, Stanford U, USA System descriptionsCarlos
E. Areces and Juan Heguiabehere, U Amsterdam, The Netherlands Simon
Colton, U Edinburgh, UK Joe
Hurd, U Cambridge, UK Mateja
Jamnik, U Cambridge, UK; Manfred Kerber, U Birmingham, UK; and Martin Pollet,
Saarland U, Germany Michael
Kohlhase, Carnegie Mellon U, USA and Jürgen Zimmer, Saarland U, Germany Jesper
Møller, IT U of Copenhagen, Denmark Stephan
Schulz, Techn. U of Munich, Germany and Geoff Sutcliffe, U Miami, USA Jörg
Siekmann, Saarland U, Germany et al. Christoph
Weidenbach, Opel AG, Germany; Uwe Brahm, MPI Saarbrücken, Germany; Thomas
Hillenbrand, MPI Saarbrücken, Germany; Enno Keen, MPI Saarbrücken, Germany;
Christian Theobalt, MPI Saarbrücken, Germany; and Dalibor Topic, MPI
Saarbrücken, Germany Michael
Whalen, U Minnesota, USA; Johann Schumann, NASA Ames, USA; and Bernd Fischer,
NASA Ames, USA | ||||||||||||
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